Pre-qualified recipes from 28nm to 3nm
Inspection sensitivity, model resolution, and false-positive thresholds tuned per process node. Ship-ready recipes reduce qualification time for mature nodes to under one week.
Pre-qualified inspection recipes available. Custom qualification support for non-standard nodes.
How inspection parameters scale with node
Model resolution, confidence thresholds, and defect size sensitivity all adjust based on the process node. Leading-edge nodes require finer sensitivity — and tighter false-positive control to match. Each node entry below reflects measured performance targets, not nominal specifications.
| Process Node | Min. Detectable Size | FPR Target | Primary inspection challenge | Qualification Status |
|---|---|---|---|---|
| 28nm | ≥1.0µm | <0.15% | Large particle control; CMP non-uniformity on tungsten contacts; wafer backside contamination | Pre-qualified — ship-ready |
| 16nm | ≥0.5µm | <0.10% | FinFET fin collapse defects; double-patterning overlay marks; resist residue at fin tips | Pre-qualified — ship-ready |
| 10nm | ≥0.3µm | <0.10% | Self-aligned contacts misalignment; multi-patterning CDU variation; increased background noise from complex device topography | Pre-qualified — ship-ready |
| 7nm | ≥0.2µm | <0.08% | EUV stochastic defects; line-end bridging; higher surface topography contrast causing threshold instability in static systems | Pre-qualified — ship-ready |
| 5nm | ≥0.1µm | <0.08% | EUV-induced local critical dimension uniformity (LCDU) failures; sub-resolution pattern collapse; sub-100nm particle sensitivity at signal-to-noise limit | Pre-qualified — ship-ready |
| 3nm | ≥0.05µm | <0.08% | Gate-all-around nanosheet defects; EUV high-NA process variation; nanosheet edge roughness classification at detection boundary | Pre-qualified — ship-ready |
| Custom / hybrid | Configured per spec | Per agreement | Memory/logic hybrid, non-standard device architectures, heterogeneous integration layers | 3–4 week qualification |
FPR targets measured at standard production conditions with adaptive calibration in production mode (lot 100+). Initial calibration phase (lots 1–50) operates at conservative thresholds; see the false-positive control methodology for calibration timeline detail.
Request a process node qualification
Provide your process node, layer list, and defect size requirements. We'll confirm recipe availability and qualification timeline before evaluation shipment.